There are sapphire wafers and substrates of various specifications in different crystal directions, thicknesses, processing accuracy requirements. Mainly sapphire wafer products are 2'', 4'' and 6'' sapphire wafers. Customization is available.



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Application

Sapphire wafer and substrate applications include:

Microelectronic IC applications

SOS Silicon-on-Sapphire

The growth of superconducting compounds / Gallium Nitride

Infrared detectors

Hybrid microelectronics

Polishing carriers

Hostile environment

Optical transmission from ultraviolet to near infrared

High temperature

Radiation resistance


Specification

Crystal Material

≥ 99.995% Al2O3, High Purity

Diameter

Ø2" 50.8mm, Ø 3" 76.2mm, Ø 4" 100mm, Ø 6" 150mm etc

Thickness

430um (Ø 2"), 430/600um (Ø 3"), 650/600 um (Ø 4"), 1000/1300um (Ø 6"),or other customized thickness available

Surface finish

One side polished (SSP), Double sided polished (DSP)

Surface Roughness

Epi-ready CMP Ra ≤ 0.3nm (polished side)

TTV/WARP/BOW

≤10um/ 10um/ 10um

Packing

Class 100 Clean room cleaning and vacuum packaging